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Nano Research

Article Title

A universal etching-free transfer of MoS2 films for applications in photodetectors

Authors

Donglin Ma, Department of Physical Chemistry, College of Chemistry and Molecular Engineering, Peking University, Beijing 100871, China
Jianping Shi, Department of Physical Chemistry, College of Chemistry and Molecular Engineering, Peking University, Beijing 100871, China Department of Materials Science and Engineering, College of Engineering, Peking University, Beijing 100871, China
Qingqing Ji, Department of Physical Chemistry, College of Chemistry and Molecular Engineering, Peking University, Beijing 100871, China
Ke Chen, Department of Physical Chemistry, College of Chemistry and Molecular Engineering, Peking University, Beijing 100871, China
Jianbo Yin, Department of Physical Chemistry, College of Chemistry and Molecular Engineering, Peking University, Beijing 100871, China
Yuanwei Lin, Department of Physical Chemistry, College of Chemistry and Molecular Engineering, Peking University, Beijing 100871, China
Yu Zhang, Department of Physical Chemistry, College of Chemistry and Molecular Engineering, Peking University, Beijing 100871, China Department of Materials Science and Engineering, College of Engineering, Peking University, Beijing 100871, China
Mengxi Liu, Department of Physical Chemistry, College of Chemistry and Molecular Engineering, Peking University, Beijing 100871, China
Qingliang Feng, Department of Physical Chemistry, College of Chemistry and Molecular Engineering, Peking University, Beijing 100871, China
Xiuju Song, Department of Physical Chemistry, College of Chemistry and Molecular Engineering, Peking University, Beijing 100871, China
Xuefeng Guo, Department of Physical Chemistry, College of Chemistry and Molecular Engineering, Peking University, Beijing 100871, China
Jin Zhang, Department of Physical Chemistry, College of Chemistry and Molecular Engineering, Peking University, Beijing 100871, China
Yanfeng Zhang, Department of Physical Chemistry, College of Chemistry and Molecular Engineering, Peking University, Beijing 100871, China Department of Materials Science and Engineering, College of Engineering, Peking University, Beijing 100871, China
Zhongfan Liu, Department of Physical Chemistry, College of Chemistry and Molecular Engineering, Peking University, Beijing 100871, China

Keywords

MoS2, etching-free, efficient transfer, ultrasonic bubbling, environmental friendliness

Abstract

ABSTRACT Transferring MoS2 films from growth substrates onto target substrates is a critical issue for their practical applications. Moreover, it remains a great challenge to avoid sample degradation and substrate destruction, because the current transfer method inevitably employs a wet chemical etching process. We developed an etching-free transfer method for transferring MoS2 films onto arbitrary substrates by using ultrasonication. Briefly, the collapse of ultrasonication-generated microbubbles at the interface between polymer-coated MoS2 film and substrates induce sufficient force to delaminate the MoS2 films. Using this method, the MoS2 films can be transferred from all substrates (silica, mica, strontium titanate, and sapphire) and retains the original sample morphology and quality. This method guarantees a simple transfer process and allows the reuse of growth substrates, without involving any hazardous etchants. The etching-free transfer method is likely to promote broad applications of MoS2 in photodetectors.

Graphical Abstract

Publisher

Tsinghua University Press

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