Chemical vapor deposition growth of large-scale hexagonal boron nitride with controllable orientation
hexagonal boron nitride, Cu foil, domain size, orientation, chemical vapor deposition (CVD)
Chemical vapor deposition (CVD) synthesis of large-domain hexagonal boron nitride (h-BN) with a uniform thickness is very challenging, mainly due to the extremely high nucleation density of this material. Herein, we report the successful growth of wafer-scale, high-quality h-BN monolayer films that have large single-crystalline domain sizes, up to ~72 μm in edge length, prepared using a folded Cu-foil enclosure. The highly confined growth space and the smooth Cu surface inside the enclosure effectively reduced the precursor feeding rate together and induced a drastic decrease in the nucleation density. The orientation of the as-grown h-BN monolayer was found to be strongly correlated to the crystallographic orientation of the Cu substrate: the Cu (111) face being the best substrate for growing aligned h-BN domains and even single-crystalline monolayers. This is consistent with our density functional theory calculations. The present study offers a practical pathway for growing high-quality h-BN films by deepening our fundamental understanding of the process of their growth by CVD.
Tsinghua University Press
Xiuju Song,Junfeng Gao,Yufeng Nie,Teng Gao,Jingyu Sun,Donglin Ma,Qiucheng Li,Yubin Chen,Chuanhong Jin,Alicja Bachmatiuk,Mark H. Rümmeli,Feng Ding,Yanfeng Zhang,Zhongfan Liu, Chemical vapor deposition growth of large-scale hexagonal boron nitride with controllable orientation. NanoRes.2015, 8(10): 3164–3176