Article Title

Lithography-free fabrication of high quality substrate-supported and freestanding graphene devices

Authors

Wenzhong Bao, Department of Physics and Astronomy, University of California, Riverside, CA 92521, USA
Gang Liu, Department of Physics and Astronomy, University of California, Riverside, CA 92521, USA
Zeng Zhao, Department of Physics and Astronomy, University of California, Riverside, CA 92521, USA
Hang Zhang, Department of Physics and Astronomy, University of California, Riverside, CA 92521, USA
Dong Yan, Center for Nanoscale Science and Engineering, University of California, Riverside, CA 92521, USA
Aparna Deshpande, Department of Physics, University of Arizona, Tucson, AZ 85721, USA
Brian LeRoy, Department of Physics, University of Arizona, Tucson, AZ 85721, USA
Chun Ning Lau, Department of Physics and Astronomy, University of California, Riverside, CA 92521, USA

Keywords

Suspended graphene, shadow mask, mobility, lithography-free, e-beam evaporation

Abstract

We present a lithography-free technique for fabrication of clean, high quality graphene devices. This technique is based on evaporation through hard Si shadow masks, and eliminates contaminants introduced by lithographical processes. We demonstrate that devices fabricated by this technique have significantly higher mobility values than those obtained by standard electron beam lithography. To obtain ultra-high mobility devices, we extend this technique to fabricate suspended graphene samples with mobilities as high as 120 000 cm2/(V•s).

Graphical Abstract

DOI

https://doi.org/10.1007/s12274-010-1013-5

Publisher

Tsinghua University Press

Recommended Citation

Wenzhong Bao,Gang Liu,Zeng Zhao,Hang Zhang,Dong Yan,Aparna Deshpande,Brian LeRoy,Chun Ning Lau, Lithography-free fabrication of high quality substrate-supported and freestanding graphene devices. NanoRes.2010, 3: 98–102