Wafer scale synthesis of dense aligned arrays of single-walled carbon nanotubes
Single-walled carbon nanotubes (SWNTs), chemical vapor deposition (CVD), photolithography, microcontact printing (μCP)
Here we present an easy one-step approach to pattern uniform catalyst lines for the growth of dense, aligned parallel arrays of single-walled carbon nanotubes (SWNTs) on quartz wafers by using photolithography or polydimethylsiloxane (PDMS) stamp microcontact printing (μCP). By directly doping an FeCl3/methanol solution into Shipley 1827 photoresist or polyvinylpyrrolidone (PVP), various catalyst lines can be wellpatterned on a wafer scale. In addition, during the chemical vapor deposition (CVD) growth of SWNTs the polymer layers play a very important role in the formation of mono-dispersed nanoparticles. This universal and effi cient method for the patterning growth of SWNTs arrays on a surface is compatible with the microelectronics industry, thus enabling of the fabrication highly integrated circuits of SWNTs.
Tsinghua University Press
Weiwei Zhou,Christopher Rutherglen,Peter J. Burke, Wafer scale synthesis of dense aligned arrays of single-walled carbon nanotubes. NanoRes.2008, 1: 158-165