rutile TiO2 thin film, laser chemical vapor deposition (LCVD), laser power, total pressure, microstructure
TiO2 thin films were prepared on Pt/Ti/SiO2/Si substrate by laser chemical vapor deposition (LCVD) method. The effects of laser power (PL) and total pressure (ptot) on the microstructure of TiO2 thin films were investigated. The deposition temperature (Tdep) was mainly affected by PL, increasing with PL increasing. The single-phase rutile TiO2 thin films with different morphologies were obtained. The morphologies of TiO2 thin films were classified into three typical types, including the powdery, Wulff-shaped and granular microstructures. ptot and Tdep were the two critical factors that could be effectively used for controlling the morphology of the films.
Tsinghua University Press
Dongyun GUO, Akihiko ITO, Takashi GOTO et al. Preparation of rutile TiO2 thin films by laser chemical vapor deposition method. Journal of Advanced Ceramics 2013, 2(2): 162-166.